Sputter yields of surfaces with nanoscale textures: Analytical results and Monte Carlo simulations

We find the spatially averaged sputter yield [Formula: see text] analytically for non-planar surfaces that have slowly varying surface heights text]. To begin, nonlocal effects like redeposition of sputtered material and secondary sputtering are neglected. show leading order corrections to proportional spatial averages The constants proportionality can be written in terms first second derivatives a flat with respect ion incidence angle For range values, is decreasing function amplitude texture. also determine how contribution depends on characteristic lateral length scale morphology. As test our theory quantify roles sputtering, we performed Monte Carlo simulations from Si targets sinusoidal by 1 keV Ar[Formula: ions. agrees remarkably well simulations. Our lead notable result atoms then strike themselves cause significant sputtering.